The BOC Edwards iH1000 iH 1000 Subfab Semiconductor Dry Vacuum Pump System Rebuilt
 
The BOC Edwards iH1000 iH 1000 Series subfab dry vacuum pumps offers high reliability for difficult harsh processes, such as Plasma-Enhanced Chemical Vapor Deposition (PECVD) and Low Pressure Chemical Vapor Deposition (LPCVD), where particulate, condensable and corrosive by-products are present. The BOC Edwards iH1000 iH 1000 subfab dry vacuum pumps operate at pressures between atmospheric and ultimate vacuum with no lubricating or sealing fluid in the pumping chamber. This ensures a clean pumping system without back-migration of oil into the system being evacuated. The BOC Edwards iH1000 iH 1000 system has an HCDP80 dry pump with HCMB-1000 dry booster pump; The Harsh Chemical Dry Pump (HCDP) has enclosed, water-cooled motors. The iH system is therefore suitable for applications in clean environments where fan cooling of motors is unacceptable. These Edwards iH1000 iH 1000 dry vacuum pumps have a gas system which introduces purge gas into the HCDP pump. This gas system is suitable for use on harsh duty processes. If you use the iH system on light or medium duty processes, you can use the economiser gas mode to reduce the consumption of purge nitrogen by the pumping system. You can manually control the iH system through the pump display terminal. Alternatively, you can use your process tool or other control equipment to control the operation of the iH system through an Interface Module or through an iM communications module accessory or you can use the iH single equipment monitor accessory to control the operation of the Edwards iH1000 iH 1000 subfab dry vacuum pump.